Abstract— We present the effect of hydrogen on surface characterization by Rf magnetron sputtered ZnO:Al thin films. ZnO:Al films are self textured and surface roughness of ZnO:Al films varies with H2 dilution ratio and ultimately affects on diffused transmittance varies from 41-27% with the variation of hydrogen (5-40%) with improved resistivity of 3.9×10-4 Ω-cm. The light scattering effect of hydrogen textured thin films was evaluated by the measurement of diffused transmittance. Experimental result shows that introduction of hydrogen effect significantly improved the light trapping in terms of diffuse transmittance without affecting electrical and other optical properties of ZnO:Al thin film.
Keywords— ZnO:Al, RF magnetron sputtering, transparent conductive oxides, Atomic force microscope, Diffused Transmittance.
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